Abstract
Thin-film electroluminescent (TFEL) displays have found applications in various industries and areas due to their unique advantages, where high brightness, a wide temperature range, and reliability are crucial. However, despite their benefits, they also face certain limitations and challenges. TFEL displays typically demand relatively high operating voltages. Total internal reflection in the multilayered structure can significantly impede light extraction from the display. In this study, we propose an optimization of the TFEL display structure to enhance light extraction efficiency and reduce operating voltage. Nanostructured indium tin oxide films, obtained by electron beam evaporation on a heated substrate, were utilized to amplify the electric field in a phosphor layer and to create a non-regular light-scattering relief that effectively breaks internal reflection conditions within the display structure. As a result, the display brightness at operating voltage increased by more than 1.5 times.
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