Abstract
Zinc oxide is nowadays widely investigated in many different science areas. In particular, this wide band gap semiconductor is valued due to its possible use in transparent electronics as TCO (Transparent Conductive Oxide) and/or as ARC (Antireflective Coating). In other applications, ZnO can also play active role in light source devices, UV detectors, solar cells, etc. In this experiment we focused on zinc oxide applicability assessment in solar cell devices. ZnO as well as its Al-doped form AZO (Aluminum doped Zinc Oxide) were examined in view of their use both as TCO and the n-type partner for the p-type gallium arsenide (GaAs) substrate, that resulted in creation of the p-n heterojunction-based photovoltaic device. In order to deposit both ZnO as well as AZO layers, the ALD (Atomic Layer Deposition) method was applied.
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