ZnO thin films produced by the RF magnetron sputtering

Abstract

ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the the grain size-, the residual stress and optical properties was investigated by X-ray diffraction, transmission spectra and photoluminescence spectra. The results show that the ZnO film deposited with sputtering power (100W) and oxygen ratio(60%), can obtain its best c-axis orientation and crystallization and that tension stress of the film reaches the lowest, and a strong UV photoluminescence(PL) peak and a weak blue emission peak were observed.