Abstract
Multi plasma jet system with 4 independent nozzles working on the principle of surface-wave discharge (SWD) has been developed. The system was optimized and used for plasma-enhanced chemical vapor deposition (PECVD) of nominally pure and Al and Mn doped ZnO thin films. The surfatron source was powered by a microwave magnetron generator working at a frequency of 2.45GHz with the output power of 300W per surfatron. The time-resolved properties of low-pressure plasma jet working under deposition conditions in pulse mode were studied using Langmuir probe. It was found that the plasma density inside the active plasma jet is about 1017m−3 and electron effective temperature can reach approximately 3eV. The set of ZnO samples with a thickness of 300nm were prepared on Si, ITO and quartz substrate and were analyzed by XRD, SEM, EDX, UV-light amperometry and optical ellipsometry. All samples under study were crystalline in nature, revealed n-type conductivity, were photo-electrochemically active and have optical band gap close to 3.5eV. The deposition condition had a strong influence on the grain size and surface morphology.
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