Abstract

ZnO micro- and nanostructures were obtained through thermal oxidation of Zn powders at high temperature under air atmosphere. A detailed study of the microstructure, morphology, optical, and photoluminescence properties of the generated products at different stages of thermal oxidation is presented. It was found that the exposure time has a strong influence on the resulting morphology. The morphogenesis of the different ZnO structures is discussed, and experimental parameters for fabricating ZnO tetrapods, hollow, core-shell, elongated, or rounded structures by thermal oxidation method are proposed on the basis on the obtained results. Notoriously, the crystal lattice of the ZnO structures has negligible residual strain, although, the density of point defects increases when the thermal treatment is extended; as consequence, their visible luminescence upon UV excitation enhances.

Highlights

  • Zinc oxide (ZnO) belongs to the IIB-VIA family

  • The set of X-ray reflections observed in the diffractogram of the precursor (S0) confirms that it is hexagonal metallic zinc (h-zinc powder (Zn); JCPDS #004–0831)

  • We propose the following hypotheses concerning methods which could allow obtaining of ZnO structures with predominant morphology by thermal oxidation of Zn powders as raw material: (1) Round-shaped particles: Oxidize zinc powder at temperatures below 400 ◦ C

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Summary

Introduction

Zinc oxide (ZnO) belongs to the IIB-VIA family This semiconductor compound has strong polar character and notorious physical and chemical stability under harsh environments. It is a polymorphic material, crystallizing in three different structures: rocksalt (Fm3m), zinc-blende (F43m), and wurtzite (P63 mc). Several methods have been developed to obtain w-ZnO crystals with desired microstructure and morphology, since upon controlling them, functional materials with designed properties could be fabricated With this purpose in mind, sol-gel, hydrothermal, solvothermal, melting, sputtering, chemical bath deposition (CBD), atomic layer deposition (ALD), molecular-beam epitaxy (MBE), pulsed-laser deposition (PLD), chemical-vapor deposition (CVD), thermal oxidation, among other techniques, have been used to fabricate plenty of ZnO structures with different morphology and size.

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