Abstract
ABSTRACTA nanometer-scale ZnO light emission array device was fabricated using the multi-level metallization technique of the CMOS process. Square arrays of pits with an inverted pyramid shape made from {111}Si planes were formed on a (100)Si substrate using selective etching. ZnO was deposited on the substrate by chemical vapor deposition (CVD), and the surface of the deposited ZnO film was carefully polished by chemical mechanical planarization (CMP). As a result, ZnO-filled nanometer-scale arrays were obtained after removing the ZnO layer except for the ZnO in the pits by CMP. Cathodoluminescence (CL) from the ZnO arrays was observed.
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