Abstract
In order to further improve the EM resistance, the preferentially-oriented Cu(111) is strongly desired. In this study, we examine whether the preferentially-oriented Cu(111) can be obtained using the ZrNx film as an underlying material. As a result, it was found that the preferentially-oriented Cu(111) on the randomly oriented ZrNx film was obtained. We demonstrated that the obtained ZrNx film is one of the excellent materials as an underlying material.
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