Abstract
Compositional and phase characteristics of TiO x N y films synthesized by ion-assisted deposition at low substrate temperatures were investigated. The films were deposited by evaporation of titanium in a mixed oxygen/nitrogen gas atmosphere. The composition of films, mainly determined by coadsorption processes, was controlled by variations of the partial pressures of the two gases, their ratio, as well as by the ratio of the total pressure and the flux density of titanium atoms to the film surface. The ion assistance was carried out by bombardment with ionized ambient molecules with energies in the range of several hundred eV. The film composition was evaluated by Auger electron spectroscopy. Selected compounds, from Ti–N up to superior Ti-oxides, were analysed by X-ray diffraction. In general, amorphous films were obtained. At a low relative content of oxygen in the gas atmosphere, δ-TiN and ε-Ti 2N phases were observed although a small amount of oxygen in the films was detected. A formation of oxide phases, Magneli phases of the type Ti n O 2 n−1 , such as Ti 3O 5, Ti 7O 13 and Ti 10O 19, was observed at elevated relative densities of ion bombardment and increased O 2/N 2 gas ratios.
Published Version
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