Abstract
TiO 2 films were prepared at room temperature by dynamic ion beam mixing where titanium was Ar + sputter deposited on iron substrates and simultaneously bombarded with argon or oxygen ion beams at an energy of 100 keV. The chemical bonding states of the elements on the surface of the films were investigated by X-ray photoelectron spectroscopy (XPS). The XPS results show that carbon on the surface of the films exhibits different states for different bombarding ion species. Argon ion beam bombardment during film deposition induced carbonization forming an O-Ti-C bonding configuration, while oxygen ion bombardment did not. A mechanism related to this phenomenon is suggested.
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