XPS study of the chemical bonding in hydrogenated amorphous germanium-carbon alloys

Abstract

A systematic study of the chemical bonding in hydrogenated amorphous germanium–carbon (a-Ge1-xCx:H)alloys using X-ray photoelectron spectroscopy (XPS) is presented. The films, with carbon content ranging from 0 at. % to 100 at. %, were prepared by the rf co-sputtering technique. Raman spectroscopy was used to investigate the carbon hybridization. Rutherford backscattering spectroscopy (RBS) and XPS were used to determine the film stoichiometry. The Ge 3d and C 1s core levels were used for investigating the bonding properties of germanium and carbon atoms, respectively. The relative concentrations of C–Ge, C–C, and C–H bonds were calculated using the intensities of the chemically shifted C 1s components. It was observed that the carbon atoms enter the germanium network with different hybridization, which depends on the carbon concentration. For concentrations lower than 20 at. %, the carbon atoms are preferentially sp3 hybridized, and approximately randomly distributed. As the carbon content increases the concentration of sp2 sites also increases and the films are more graphitic-like.