Abstract
We describe the application of X-ray photoelectron spectroscopy (XPS) to the study of the kinetics and thermodynamics of molecular N 2-adsorption on a Ni(110) surface. Adsorption isotherms and isobars were recorded by continuously monitoring the intensity of the 406.7 eV N 1s “shake up” peak. From these data isosteric heats of adsorption were calculated which are in good agreement with the results obtained by thermal-desorption spectroscopy and surface potential measurements. The general applicability and the limits of this method will be discussed.
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