Abstract
Composite SiNx/DLC films were deposited on silicon substrate by co-deposition system. The carbon plasma was generated by filtered cathodic arc source, simultaneously incorporated with silicon nitride from RF magnetron sputtering. The silicon nitride sputtering rate was maintained by fixed RF power at 100W while the arc current of FCA was varied from 20 to 80A.The SiNx/DLC film composition and optical properties were investigated by X-ray photoelectron spectroscopy and spectroscopic ellipsometry respectively. The results revealed that the atomic concentration of carbon increased while those of silicon and nitrogen decreased with increasing arc current. The oxidation was found on the film surface and related to the atomic concentration of silicon. The optical properties can be changed as a function of carbon concentration by setting different arc current. In this work, the volume percentage of carbon obtained from spectroscopic ellipsometry using Bruggeman EMA model showed good numerical correlation with the atomic percentage of carbon from XPS analysis with the range spanning across 75-95 at. %.
Published Version
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