Abstract
Xe plasma FIB Delayering of IC based on 14 nm node technology
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https://doi.org/10.1017/s1431927616001136
Copy DOIJournal: Microscopy and Microanalysis | Publication Date: Jul 1, 2016 |
Citations: 5 |
Xe plasma FIB Delayering of IC based on 14 nm node technology
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