X-ray Reflecto-Interferometry Technique Using a Microfocus Laboratory Source

Abstract

An X-ray interferometry technique using an X-ray microfocus laboratory source for thin-film structure research based on compound refractive lenses has been proposed. The main advantage of this technique is to use a very simplified experimental setup where a focused X-ray beam reflected from parallel flat surfaces creates an interference pattern in a wide angular range. Due to this, the interference pattern can be obtained in a single shot without the need to rotate the specimen or the detector. The applicability of this technique has been demonstrated using the MetalJet Excillium micro-focus laboratory source, which has GaKα emission line at 9.25 keV. As a result, a series of interference patterns for test sample a free-standing thin-film membrane, thickness 500 nm, was observed. Based on the obtained results the main advantages of this technique such as high spatial and temporal resolution are shown, and also possible application of the reflecto-interferometry both at the laboratory and synchrotron radiation X-ray sources are proposed.