Abstract
X-ray reflecto-interferometry technique based on compound refractive lenses using an x-ray laboratory source was proposed to study thin-film structures. The setup for this experiment is very simple: a focused x-ray beam is reflected from parallel flat surfaces, which creates an interference pattern in a wide angular range, therefore the interference pattern can be obtained in a single shot without the need to rotate the sample or the detector. The reflecto-interferograms for Si<sub>3</sub>N<sub>4</sub> membranes were obtained using the MetalJet Excillium micro-focus laboratory source with GaKα emission line at 9.25 keV. The experimentally obtained film thickness is in good agreement with the declared characteristics.
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