X-ray photoelectron spectroscopy studies of high-dose nitrogen ion implanted-chromium: a possibility of a standard material for chemical state analysis

Abstract

To examine the possibility of utilizing an ion-implanted material for a standard sample of XPS chemical state analysis, a chromium metal ion implanted with nitrogen in a high dose was studied by XPS. In the implanted layer, the nitrogen density distribution ranged from zero to the maximum density of 40at.%, and different chemical states of chromium existed depending on nitrogen density. The binding energy of the XPS lines shifted in a simple relationship to the N : Cr atomic ratio. Good agreement in the binding energy data between the ion-implanted chromium and stoichiometric nitrides indicated that there is a good possibility of ion-implanted materials being used as standard samples.