Work Function Extraction of Transparent Conducting Indium Oxide Films Used As Gate Electrode for MOSFET

Abstract

Indium Oxide (In2O3) has received a great deal of attention recently as a transparent conducting oxide (TCO) semiconductor that finds applications in photovoltaic solar cells, transparent windows [1] and flat panel displays due to its high electrical conductivity and good optical transparency in the visible region [2]. It is critical to understand the work function (WF) of a material since it is an important characteristic which has an impact on the device performance.In this work, WF of In2O3 has been estimated by fabricating n-Metal Oxide Semiconductor Field Effect Transistor (NMOSFET). Fabrication of two MOSFET devices has been carried out using four-level mask. The source and drain contacts for both the devices have been prepared by using Aluminum metal. The gate contact for one of the MOSFET devices was prepared using Aluminum metal and transparent conducting In2O3 is used as the gate contact for the second MOSFET. Aluminum deposition was carried out using thermal evaporation technique. A 2-inch copper-backed indium target is used to deposit thin films of In2O3 by RF magnetron sputtering and varying the oxygen gas flow. The substrate temperature is held constant at room temperature. Electrical characterization is performed on the fabricated MOSFETs which is further used in extracting the WF of In2O3 thin films. Timo Jäger, Yaroslav E. Romanyuk, Shiro Nishiwaki, Benjamin Bissig, Fabian Pianezzi, Peter Fuchs, Christina Gretener, Max Döbeli, and Ayodhya N. Tiwari , "Hydrogenated indium oxide window layers for high-efficiency Cu(In,Ga)Se2 solar cells" , Journal of Applied Physics 117, 205301 (2015)Min-Suk Lee, Won Chel Choi, Eun Kyu Kim, Chun Keun Kim, Suk-Ki Min, Characterization of the oxidized indium thin films with thermal oxidation, Thin Solid Films, Volume 279, Issues 1–2, 1996, Pages 1-3, ISSN 0040-6090.