Abstract
Undyedand dyed versions of AZ5214 were processed in the image reversal mode over substrates of varying topography and reflectivity, including 4M test topographies or shrinked versions of the latter. Specifically designed in-line equipment was employed for the process steps subsequent to the i-line stepper exposure. Tests using flat substrates confirmed process uniformity. Resolution in the 0.6 - 0.7 μm range as well as wide process latitudes with regard to variations of dose and focus were found for process levels like LOCOS, poly II and poly III. Additionally, imaging tests over 4M relevant topographies were performed for the contact and the aluminum levels.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
