Abstract
Process window is a collection of values of process parameters that allow circuit to be manufactured and to operate under desired specifications. For instance, lithographic process window is typically defined as the set of {focus, exposure} points to control critical dimension (CD) variation to within 10%. One simple way visualizing it is using a Focus-Exposure Matrix (FEM) curve which plots exposure vs. defocus for a given linewidth tolerance. Maximal inscribed rectangle in this plot then represents the process window [1]. Of course, metrics can go beyond linewidth (e.g., sidewall angle) as can process variables (e.g., overlay, temperature). Furthermore, the overall process window for a design will be intersection or overlap of process windows for all different layout patterns existing in the design (e.g., isolated vs. dense lines) [2].
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
