Abstract
Abstract Various chemical vapor deposition (CVD) techniques, based on thermal CVD and ion beam assisted deposition, were used to deposit wedge-shaped SiO 2 or Al 2 O 3 membranes with controlled thickness gradients on gas sensor microarrays. Such a microarray consists of many gas sensors formed by segmentation of a sputtered metal oxide layer with parallel platinum strip electrodes. Owing to the varying thickness of the coating across the microarray a gradual change of the gas sensing properties of the sensor segments was achieved. The membranes with a thickness of up to about 500 nm were analyzed using X-ray photoelectron spectroscopy, secondary neutral mass spectrometry and ellipsometry in order to determine the chemical composition and the layer thickness of the membrane, as well as the thickness gradient. Wedge-shaped membranes with thickness gradients of 8.5 to 193 nm mm −1 were obtained.
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