Abstract

Nanostructured alpha-iron oxides are fabricated via ALD and CVD using an iron ketominate precursor by Anjana Devi and co-workers in article number 1700155. Both processes ensure deposition of iron oxide in a temperature range of 100–800 °C, enabling fine tuning of crystallinity and morphology. Iron oxide photoanodes are active in photooxidation of water with current densities of 1.2 mA cm−2 at 1.6 V versus RHE under simulated sunlight.

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