Abstract
The effects of void-based photonic crystal mirrors on reflectivity and dissipation for extreme-ultraviolet (EUV) radiation at near-normal illumination are studied. The mirrors are based on a multilayer coating comprising alternating layers of molybdenum (Mo) and silicon (Si) with 40 periods. By embedding voids in silicon films instead of molybdenum films, we found that the reflectivities of the mirror are increased and the absorptions of the mirror are decreased with the increments of the voids. On the other hand, the reflectivities of the mirror are decreased and the absorptions are increased by embedding voids in the molybdenum films, with the increments of the voids. Compared to the standard designs of 40 Mo/Si multilayer mirrors, which are currently used in most EUV or soft x-ray applications, the reflectivity of the void-based photonic crystal mirror in our study can reach from 73.43 to 83.24% and the absorption can decline from 26.18 to 16.80%. In consideration of EUV bandwidth, the effects of illumination angles in the six-mirror projection system, the intermixing layers, and the variation of the coated absorber thickness on the reflection properties are studied. The proposed concept can be used in next-generation EUV lithography and soft x-ray optical systems.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
