Abstract
The plasma focus of a magnetoplasma compressor is a unique source of high-brightness broadband VUV (with photon energy of 5 to 100 electron volt) radiation. When such radiation affects on the surfaces of materials, it is possible to generate rather complex gas-dynamic structures due to the evaporation of the material and ionization of its vapors. A separate task is to study the processes of a gas-dynamic response to the exposure of the specified radiation fluxes on the surface of interference antireflection and reflective multilayers, which are used in modern laser technology, high-power optoelectronics, etc. In this report, we used schlieren photography for studying the features of gas-dynamic structures that arise at irradiation of coatings. Radiation resistant (in the visible and near IR ranges) HfO2/SiO2 and ZrO2/SiO2 multilayer structures (with a total thickness of 140–3700 nanometers and a number of layers of from 2 to 24) were used as prototypes for testing their stability under the VUV exposure.
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