Abstract
We present a novel, to the best of our knowledge, broadband and angle-insensitive nearly perfect absorber design composed of alternate silica and chromium layers. We show that by depositing a chromium nanofilm on a chromium substrate with a silica spacer, the absorption will significantly enhance from the visible to near-infrared. Then, another silica film is placed on the top of the layered structure as an antireflection coating, resulting in the broadband near-perfect absorption. We fabricate the proposed absorber by magnetron sputtering. The measured results show that our device has an average absorption over 97% in a wide range of wavelengths ranging from 350 to 1170 nm, and its absorption performance exhibits a good angular tolerance up to 50°. The presented absorber design offers a good prospect for large-scale and low-cost manufacturing of absorption-based optoelectronic devices.
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