Abstract
Abstract Perfect absorption over the entire visible spectrum can create a dark background for acquiring images with high contrast and improved resolution, which is crucial for various applications such as medical imaging, biological detection, and industrial non-destructive testing. The broadband absorption is desired to be achieved in an ultrathin structure for low noise as well as high integration. Here, we experimentally demonstrate a metasurface broadband perfect absorber with an ultrathin thickness of 148 nm and a large area of ∼10 cm2. Such a metasurface, with more than 97% absorption in the wavelength range from 400 to 800 nm, is composed of chromium nanodisk hexagonal array deposited on a chromium substrate with a silica spacer. A self-assembly based colloidal lithography nanofabrication method is developed for the scalable fabrication of the proposed nanostructure. We attribute the broadband absorption to the spectrally overlapped Fabry–Perot resonance, surface plasmon polariton, and localized surface plasmon resonances. Our results offer a novel approach to wafer-scale and low-cost manufacturing of absorption-based devices for applications such as high-contrast imaging and optical modulation.
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