Abstract
Due to the great development of light sources for several applications from displays to lighting, great efforts are devoted to find stable and efficient visible emitting materials. Moreover, the requirement of Si compatibility could enlarge the range of applications inside microelectronic chips. In this scenario, we have studied the emission properties of bismuth doped yttrium oxide thin films grown on crystalline silicon. Under optical pumping at room temperature a stable and strong visible luminescence has been observed. In particular, by the involvement of Bi ions in the two available lattice sites, the emission can be tuned from violet to green by changing the excitation wavelength. Moreover, under electron beam at low accelerating voltages (3 keV) a blue emission with high efficiency and excellent stability has been recorded. The color is generated by the involvement of Bi ions in both the lattice sites. These peculiarities make this material interesting as a luminescent medium for applications in light emitting devices and field emission displays by opening new perspectives for the realization of silicon-technology compatible light sources operating at room temperature.
Highlights
Luminescent thin films are gaining increasing attention as visible emitters for optoelectronic devices, bio imaging, drug delivery, solid state lasers as well as flat panel displays (FPDs)[1]
In order to study the optical properties of dissolved Bi ions in Y2O3 host, PL spectra have been firstly recorded by scanning the excitation wavelength, λexc, in the ultraviolet range between 300 nm and 400 nm that potentially can involve all the possible Bi oxidation states
We have demonstrated that under optical pumping Y2O3:Bi exhibits a stable and strong visible luminescence at room temperature (RT) which can be tuned from violet to green by changing the excitation wavelength, due to the involvement of Bi ions in the two available lattice sites
Summary
Luminescent thin films are gaining increasing attention as visible emitters for optoelectronic devices, bio imaging, drug delivery, solid state lasers as well as flat panel displays (FPDs)[1]. Phosphor thin films have been recently proposed to replace the conventional powder phosphors due to several advantages, such as the lower operation voltage and the endurance to much higher power densities without degradation both for LEDs and FEDs. In addition, the emission intensities are limited by the light trapping inside the luminescent layers, phosphor thin films offer other strengths, such as higher contrast and resolution, better thermal stability, superior thermal conductivity, a high degree of uniformity and better adhesion to the substrate compared with the conventional display screen prepared by the direct deposition of phosphor grains[2].
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
