Abstract
A 3 x 3 micromirror array has been designed and successfully fabricated by multilayer silicon surface micromaching technology. It is composed of a bottom electrode, a supporting part, and a mirror plate and can modulate both phase and amplitude of incident light. The maximum deflection length along the vertical direction of the mirror plate is 2 microm, and the rotation angles about the Y and X axes are +/-2.3 degrees and +/-1.45 degrees, respectively; one can obtain an even larger deflection by simply increasing the thickness of the sacrificial layers.
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