Abstract
A novel 3 × 3 micromirror array is designed and successfully fabricated with multi-layer silicon surface micromachining technology using phosphosilicate glass as sacrificial layer and polysilicon as structural layer. It is composed of a bottom electrode, a support part and a mirror plate, in which a T-shaped beam structure is used to support the mirror plate. It can provide the mirror with vertical movement and rotation about two horizontal axes, thus enabling phase and amplitude modulation of the incident light. The results show that the maximum deflection length of the mirror plate along the vertical direction is 2 µm, while the rotation displacements about X- and Y-axes are ±1.45° and ±2.3°, respectively, and an even larger deflection magnitude can be obtained through simply increasing the thickness of the sacrificial layers.
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