Abstract
Indium tin oxide (ITO) films have been deposited by reactive d.c.-sputtering and also by the reactive thermal evaporation technique onto glass substrates. The relationship between the microstructure and composition of the ITO films was found to strongly depend on the deposition technique. In addition the application of pure water vapour as the reactive sputtering atmosphere and its influence on the structural and compositional properties of the ITO films has been studied.
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