Abstract
Optical constants of thin films in the vacuum ultraviolet spectral range are often not precisely known, since not only the experimental determination is difficult, but also the results depend on the sample preparation. We compared measurements in the wavelength interval between 130 nm and 226 nm using reflectometry and ellipsometry with particular regard to their respective uncertainty budgets. Since for both methods a numerical analysis is required to obtain the optical constants from the measured data, particular attention was paid to the error propagation through the calculation routines, and the uncertainties introduced by the numerical methods and models themselves. The measurement methods were applied to a thin layer of 6 nm titania (TiO2) on a silicon substrate. The result is used to validate our method, and to identify further analytical requirements.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.