Abstract
An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 ◦ C and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1×10 −4 , respectively. OCIS codes: 310.0310, 310.1860. doi: 10.3788/COL201311.S10607. CaF2, fused silica, and MgF2 are optical materials commonly used for optical coatings in precision optical applications owing to their high transparency in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
