Abstract
We have focused our attention on the valence-band density of states (VB-DOS) of near-noble-metal monosilicides (NiSi, PdSi, and PtSi) from the study of soft-x-ray-emission spectroscopy. These three silicides have several similarities, i.e., electron configuration for each metal atom and crystallographic structure of each silicide. However, the spectral shape of the Si ${\mathit{L}}_{2,3}$ emission, which has information of the Si s and/or the d VB-DOS, of each silicide has indicated the clear differences from each other. Moreover, it is shown that these characteristics are closely related to the features observed in the Si p state derived from Si K\ensuremath{\beta} emission spectra. From the spectral analysis related to the energy difference between Si p bonding and antibonding states considering the interaction strength of the Si p-metal d of each silicide, the influence of Si-Si interatomic distance on the value of the full width at half maximum of the Si s bonding state and the Si s and/or d contribution on the upper part of the VB-DOS structure, we have suggested a valence-band structure of near-noble-metal monosilicides.
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