UV Nanoimprint Lithography—Impact of Coating Techniques on Pattern Quality

Abstract

In this work, three different coating techniques are compared and their applicability for ultraviolet nanoimprint lithography (UV-NIL) is investigated. As UV-NIL is considered a suitable volume manufacturing production solution for various emerging applications, it is mandatory to consider environmental aspects such as operational energy use and material consumption as well as waste management. In this paper, spin coating, spray coating, and inkjet coating are used to coat both a high refractive index resin (n = 1.9) and a filler-free resin (n = 1.5), respectively. Variable Angle Spectroscopy Ellipsometry (VASE) was used to analyze the influence of different process parameters on the resin thickness as well as to compare the refractive index achieved from each coating technology. Finally, the applicability of the different coating methods for UV-NIL was investigated by imprinting the resin layers with different test structures. For the final imprints, the resolution, the surface roughness, and the pattern fidelity over 25 imprints was assessed using AFM. Finally, a comparison of the resin consumption and the process time was performed for each coating method.