Abstract
This paper reports on a newly developed anti-sticking resin obtained by mixing a fluorine-containing monomer (F-monomer) for UV nanoimprinting lithography (UV-NIL) to reduce the contact adhesion force during the demolding process. The new resin system shows an enhanced reliability and resolution of pattern transfer with no treatment on the surface of the quartz stamp. We fabricated various nanopatterns with F-monomer resins of various concentrations in the low pressure UV-NIL. The number of process steps of a release layer treatment for UV-NIL was reduced by using F-monomer with anti-sticking property.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
