Abstract

Many pathological problems are initiated by ultraviolet radiation (UVR), such as skin cancer, the most commonly diagnosed cancer worldwide. The UVA (320–400 nm) and UVB (290–320 nm) wavelengths may cause effects such as photoaging, DNA damage, and a series of cellular alterations. The UVA radiation can damage the DNA, oxidize the lipids, and produce dangerous free radicals, which can cause inflammation, modify the gene expression in response to stress, and weaken the skin immune response. With a minor penetration, the UVB radiation is more harmful, being responsible for immediate damage. Ultraviolet radiation light emitted by the sun is considered necessary for the existence of life but cause radiation problems, especially in the skin. The photoprotective activities of plant extracts and isolated composts were evaluated by many reports, as well as the correlation of these compounds with the antioxidant activity. This review presents plant compounds with interest to the cosmetic industry to be used in sunscreens such as flavonoids and cinnamates.

Highlights

  • Many pathological problems are initiated by ultraviolet radiation (UVR), such as skin cancer, the most commonly diagnosed cancer worldwide that can cause a high mortality rate when it evolves into a worst type, the melanoma. e UVA (320–400 nm) and UVB (290–320 nm) wavelengths that act in the skin cause effects such as photoaging, photosensitivity (DNA damage), appearance of wrinkles, and a series of cellular alterations involving fibroblasts and melanocytes due to UVA radiation, which possesses a greater power to penetrate the skin. e UVA radiation can damage the DNA, oxidize the lipids, and produce dangerous free radicals, which can cause inflammation, break the cellular communication, modify the gene expression in response to stress, and weaken the skin immune response

  • Zinc oxide and titanium dioxide are the inorganic substances most utilized for photoprotection. ey present excellent protection against UV radiation and their advantage is that they are chemically inert and do not cause allergic sensitization. ese substances are recommended for the manipulation of pediatric photoprotection and for people with sensitive skin. ese particles are often visible on the skin, and it becomes an inconvenience for consumers of these cosmetics [5, 14]

  • Flavonoids and cinnamates present in many plant extracts have essential characteristics to be sunscreens, such as absorption of ultraviolet rays, as well as antioxidant activity, usefulness in cosmetics, action against free radicals, and controlling the early ageing caused by various external factors

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Summary

Introduction

Many pathological problems are initiated by ultraviolet radiation (UVR), such as skin cancer, the most commonly diagnosed cancer worldwide that can cause a high mortality rate when it evolves into a worst type, the melanoma. e UVA (320–400 nm) and UVB (290–320 nm) wavelengths that act in the skin cause effects such as photoaging, photosensitivity (DNA damage), appearance of wrinkles, and a series of cellular alterations involving fibroblasts and melanocytes due to UVA radiation, which possesses a greater power to penetrate the skin. e UVA radiation can damage the DNA, oxidize the lipids, and produce dangerous free radicals, which can cause inflammation, break the cellular communication, modify the gene expression in response to stress, and weaken the skin immune response. These compounds protect the skin by absorbing the radiation. There are organic sunscreens in the market that absorb 95% of the (290–320 nm) wavelengths, protecting against erythema and skin wrinkling, and reflect UV radiation [5, 14]. Many of these molecules are aromatic compounds that have carboxyl groups and, generally, they present an electron-donating group, such as amine or a methoxyl group, in the ortho or para positions [25]. Antioxidant Effect and Its Association with Photoprotective Effect of Natural Products e plant kingdom produces secondary metabolites that are synthesized to develop protective functions against hostile

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