Abstract
In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.
Highlights
Ti-6Al-4V alloy is one of the most studied and used titanium alloys in the aeronautics industry
The results indicated that LayerProbe is a very important technique to determine the thickness of individual layers of a multilayer material
Cr thin films improved the adhesion between silicon carbide (SiC) film and Ti-6Al-4V substrate probably caused by the increase in the surface roughness
Summary
Ti-6Al-4V alloy is one of the most studied and used titanium alloys in the aeronautics industry. Amorphous SiC films can be deposited at low temperatures by techniques assisted by cold plasmas[3,5]. The sputter probability of ionized species is higher in a HiPIMS discharge[9] These species can be accelerated toward the substrate; as a consequence, the adhesion, hardness, and homogeneity of the films can be improved. Even using the HiPIMS technique, in some cases the energetic bombardment of the substrate by the sputtered particles is not high enough to obtain good film-substrate adhesion[10]. Cr and SiC films were deposited by the HiPIMS technique
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