Abstract
Homogeneous (HM) and functionally graded (FG) TiN thin films were produced by the grid-assisted magnetron sputtering (GAMS) technique. The joint use of ball-cratering micro-abrasive wear test (BCMA) and nanoscratching (NN) test was proposed and carried out to evaluate the wear resistance of TiN films. The results showed an increase of 33.3% wear resistance in the FG TiN thin film, when compared with the HM TiN thin film. This result was justified by the higher resistance to nucleation and propagation of cracks and higher level of adhesion to the substrate by the FG TiN thin film, validated through the NN tests.
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