Abstract
An apparatus is described in which surface chemical analysis by Auger electron spectroscopy (AES) is carried out simultaneously with inert gas sputtering to obtain composition profiles normal to the solid–vacuum interface. Chemical profiles are presented for as-evaporated and air-heated nichrome thin film resistors.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Paper Title
Journal
Date
