Abstract
We present an updated global model for x-ray lithography based on realistic models for image formation, demonstrating how the extendibility of x-ray lithography is well in the nanometer range. We apply these models to define the most convenient spectral range for x-ray lithography manufacturing and the parameters of mirrors and filters to be used in an optimized beam line.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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