Abstract
Ion sheaths formed in the up- and downstream sides of a negatively biased metal plate/mesh in an ion-beam-background-plasma system were experimentally investigated in a double plasma device. Measured potential profiles near the plate exhibit asymmetric structure, showing thicker sheath in the downstream side. The presence of the ion beam causes the shrink of the sheaths on both sides. The sheath thickness decreases with the increase of beam energy and density. Furthermore, the sheaths near the mesh are substantially thinner than that near the plate because of the partial transmission of the mesh to the ions. In addition, the increase of neutral gas pressure leads to the reduction of the beam energy and density, resulting in the increase of the sheath thickness.
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