Abstract
The characteristics of magnetized electron sheath near a positively biased conducting wall parallel to magnetic field formed between two permanent magnetic plates were experimentally investigated in a double plasma device. The magnetic field strength between the magnetic plates is about 1200 G which is sufficient to magnetize the plasma such that the ion gyroradius is comparable to the electron Debye length. A virtual cathode (or potential dip) structure was found between the electron-rich sheath and bulk plasma. For a given neutral gas pressure, the potential minimum (dip position) remains almost the same for different positive biases on the wall. For a given bias on the wall, however, the electron sheath thickness and the potential drop from the bulk plasma to the dip decrease with the increase of the neutral gas pressure. In addition, the electron sheath and potential dip appear to be wider and deeper in the downstream side of the wall.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.