Abstract
PbO – MgO – Nb 2 O 5 – TiO 2 (PMNT) pyrochlore thin films were prepared on Pt-coated silicon substrates by radio-frequency magnetron sputtering and postdeposition annealing method. Very interestingly, these pyrochlore-structured PMNT thin films exhibited ultralow dielectric losses, with a typical loss tangent as low as 0.001, and relatively high dielectric constants, typically εr∼170. It was found that the relative permittivity slightly but continuously increased upon cooling without any signature of a structural phase transition, displaying a quantum paraelectriclike behavior; meanwhile, the PMNT pyrochlore thin films did not show any noticeable dielectric dispersion in the real part of permittivity over a wide temperature range (77–400 K). Their dielectric responses could, however, be efficiently tuned by applying a dc electric field. A maximum applied bias field of 1 MV/cm resulted in a ∼20% tunability of the dielectric permittivity, giving rise to a fairly large coefficient of the dielectric nonlinearity, ∼2.5×109 J C−4 m−5. Moreover, the PMNT pyrochlore films exhibited superior electrical insulation properties with a relatively high breakdown field (Ebreakdown∼1.5 MV/cm) and a very low leakage current density of about 8.2×10−7 A/cm2 obtained at an electric field intensity as high as 500 kV/cm.
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