Unipolar and bipolar mode of deep oscillation magnetron sputtering

Abstract

The paper presents the results of a study of the modes of dual deep oscillation magnetron sputtering. The use of packet pulse discharge power supply allowed to provide a high power density on the surface of the Al target 60–500 W·cm−2 and the ion current density on the substrate 4–20 mA·cm−2 during the duration of the macro pulse – 1 ms. In addition to the parameters of a pulsed power supply, the way of connecting the power source to the dual magnetron sputtering system and the vacuum chamber changed during the experiments. Targets of the magnetron sputtering system were isolated from the chamber or alternately connected to it. A change in the connection method led to a change in the anode area and such discharge parameters as: discharge current, plasma concentration, bias voltage, and ion current density on the substrate. It is shown that in the mode with a small area of the anode, the substrate is exposed to a higher energy impact in comparison with the regime when the anode had a large area.