Uniaxial in-plane magnetic anisotropy mechanism in Ni, Fe, and Ni-Fe alloy films deposited on single crystal Y-cut 128° LiNbO3 using magnetron sputtering

Abstract

We investigated the mechanism of induced in-plane uniaxial magnetic anisotropy (Ku) in Nickel (Ni), Iron (Fe), and Ni-Fe alloy films deposited in situ on a single-crystal 128° Y-cut LiNbO3 (LNO) substrate at various substrate heating temperatures (Th) in the range 30–400 °C through radio frequency magnetron sputtering or co-sputtering. The results show that the Ku values for the Ni, Fe, and Ni-Fe alloy films are induced in the (01.2) or (21¯.0) planes of the LNO substrate. The highest value of Ku for the Ni films was observed at Th = 200 °C, which is owing to the increased orientation of the fcc Ni (311) plane. The Ni film with thickness t ∼ 20 nm deposited on the LNO substrate at Th = 200 °C possesses the highest value of Ku. Density functional theory calculations show that the magnetic anisotropic energy on the fcc Ni (311) plane differs depending on the magnetization direction in the in-plane direction in the model. Meanwhile, the value of Ku for the Fe films decreases with an increase in the value of Th because the films with higher Th are polycrystalline and have an oxide layer. The composition dependence of Ku for Ni-Fe alloy films at Th = 30 °C shows a trend similar to the crystal magnetic anisotropy for bulk Ni-Fe alloy. The induced Ku on LNO is attributed to the magnetostriction effect with the change in the crystal orientation of the ferromagnetic metal owing to a strain from the LNO substrate through the thermal expansion during sputtering. These results indicate the origin of the induced Ku in the Ni and Fe based metallic material films deposited on the LNO substrate.