Ultraviolet assisted liquid spray dielectric barrier discharge plasma-induced vapor generation for sensitive determination of arsenic by atomic fluorescence spectrometry

Abstract

In this study, a novel sensitive method for As determination by atomic fluorescence spectrometry was developed based on UV-assisted liquid spray dielectric barrier discharge (UV-LSDBD) plasma-induced vapor generation. It was found that prior-UV irradiation greatly facilitates As vapor generation in LSDBD likely because of the increased generation of active substances and the formation of As intermediates with UV irradiation. The experimental conditions affecting the UV and LSDBD processes (such as formic acid concentration, irradiation time, the flow rates of sample, argon and hydrogen) were optimized in detail. Under the optimum conditions, As signal measured by LSDBD can be enhanced by about 16 times with UV irradiation. Furthermore, UV-LSDBD also offers much better tolerance to coexisting ions. The limit of detection was calculated to be 0.13 μg L−1 for As, and the relative standard deviation of the repeated measurements was 3.2% (n = 7). The accuracy and effectiveness of this new method were further verified by the analysis of simulated natural water reference sample and real water samples. In this work, UV irradiation was utilized for the first time as an enhancement strategy for PIVG, which opens a new approach for developing green and efficient vapor generation methods.