Abstract
AbstractPI surfaces were modified by RF plasma sputtering of a PTFE target. Ultrathin fluoropolymer films of 10–50 nm thickness were deposited. The sputter‐deposited polymeric films were characterized by XPS, ToF‐SIMS and FT‐IR spectroscopy. The results indicated that the chemical composition and molecular structure of the films depended strongly on the type of the sputtering gas used. Water contact angle measurements showed that the sputter‐deposited PTFE film could effectively passivate the PI surface. The topography of the modified PI surface was investigated by AFM. The 180°‐peel adhesion test results suggested that all the sputter‐deposited films adhered strongly to the PI substrates.magnified image
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