Abstract
Abstract : In the Phase I program, PLASMION demonstrated the capability of Negative Sputter Ion Deposition to deposit optical thin films with state-of-the-art properties, specifically ultrasmooth surfaces, high packing density, refractive index close to bulk values, and stability to environmental exposure. The objective of this Phase II program was to utilize these films to fabricate high-quality, economical optical devices for high energy laser applications. Prototype dielectric mirrors will be delivered which have higher reflectivity, lower loss, and higher laser damage threshold than currently available technology, with lower projected costs per unit. PLASMION accomplished these goals by designing and constructing a flexible system for the fabrication of state-of-the-art thin film optical devices using Negative Sputter Ion Deposition. This system was used to fabricate the deliverable devices for the Phase II program, and will also serve as the platform for PLASMION s planned commercialization of optical thin film deposition equipment in Phase III.
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