Abstract
To break through the diffraction limit by optical super-resolution thin films is very attractive for the applications in optical and photonic devices. Large optical nonlinearities, such as optic-thermal nonlinearity and the third order optical nonlinearity, of optical thin film materials are very critical to super resolution optical storage, imaging, lithography, and the enhancement of the throughput of the optical near-field nano-aperture. The super-resolution effect in optical thin films or film structures under laser irradiation is focused in this paper. And its applications, especially in super high density optical storage are analyzed and discussed.
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