Abstract
We have devised a method to produce gold films with ultralarge atomically flat areas for use in scanning probe microscopy. A means roughness of 2 Å for areas of 2.25 μm 2, and about 3 Å for 25 μm 2, can be easily produced. The method is based on: (i) epitaxial growth of gold on mica; gold is thermally deposited onto freshly cleaved mica sheets, (ii) glueing the fresh gold surface to a piece of Si wafer, and (iii) chemical or consecutive mechanical stripping of the mica down to the freshly appearing gold surface (i.e., template-stripped gold). We present a detailed STM and AFM roughness study of these gold films.
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