Abstract
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.
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